THIN FILM DEPOSITION TECHNOLOGY
Learning outcomes of the course unit
The course has a "theoretical" part on the described topics (˜ 10 hours) and a "practical" part in which thin film deposition techniques will be tried out in the "Laboratorio Film Sottili" (Thin Film Laboratory) of the Physics Department (˜ 30 hours).
With this set-up the course aims to provide the basic information necessary to be able to deposit a polycrystalline thin film of any element or compound on both amorphous and crystalline substrates.
Students who have attended the "Vacuum and Low Temperature Technology" lectures do not have to attend parts 1 and 2 (Vacuum topics) of this course.
Course contents summary
1 Introduction to vacuum theory
1.1 What vacuum is, how it is obtained, basic concepts of fluid dynamics, flow rate
1.2 Vacuum pumps:
1.2.1. Primary vacuum pumps: Water pump, rotary pumps, root pumps.
1.2.2. High vacuum and ultra high vacuum pumps: diffusion pumps, turbomolecular pumps, cryogenic pumps, ionic pumps, sublimation pumps.
2 Vacuum measurement
2.2 Mechanical, diaphragm, Bourdon gauges,
2.3 Liquid manometers, McLeod gauge,
2.4 Capacitance gauges,
2.5 Thermal gauges, thermocouple vacuum gauges, Pirani gauges,
2.6 Ionization gauges, "hot cathode" ionization heads, "cold cathode", Penning gauges,
2.7 Residual gas analysers (RGA).
3 Polycrystalline thin film growth
3.1 Condensation, nucleation, thin film growth
3.2 Influence of the substrate on growth
3.3 Influence of deposition parameters on growth
3.4 Thickness of films (measurement) and their composition
4 Thermal deposition techniques
4.1 Simple evaporation
4.3 Evaporation in CSS (close-spaced sublimation) controlled atmosphere)
4.4 Evaporation of low vapour tension elements and compounds - e.b.g.- (electron-beam gun)
5 Sputtering deposition techniques
5.1 Discharge in gases
5.2 The physical phenomenon of sputtering
5.3 D.C. sputtering
5.4 R.F. sputtering
5.5 R.F. magnetron sputtering
5.6 Reactive sputtering
5.7 Influence of deposition parameters on growth
1)"Introduzione alla Tecnologia del Vuoto", Bruno Ferrario, Patron Editore, Bologna,1999.
2)"Handbook of Thin Film Technology", Maissel & Glang, McGraw-Hill, 1997.
3) ?Thin Film Process?, J. L. Vossen and W. Kern, Academic Press, Inc, 1999
4) Notes from the lectures.